Die klassische Nanoimprint-Lithogaphie (NIL) verfolgt das Ziel, Nanostrukturen effizient auf Oberflächen zu replizieren.

Im Rahmen generativer Fertigungsmethoden ist das additive Nanoimprinten eine Möglichkeit, die Oberflächen additiv gefertigter Bauteile mit speziellen Funktionalitäten zu versehen.

PROFACTOR konzentriert sich in der Forschung auf mehrere Herausforderungen:

  • Nanoimprint auf gekrümmten Oberflächen: Die für möglichst flache Oberflächen entwickelte NIL muss für makroskopisch gekrümmte Oberflächen adaptiert werden.
  • Nanoimprint – mehrlagig und mit unterschiedlichen Materialien: Im Mittelpunkt steht das Zusammenwirken von unterschiedlichen Materialien für spezifische Funktionalitäten.
  • Materialentwicklung: Die Materialien müssen für die Anforderungen von additiven Prozessen modifiziert werden.

Projekte

Viele denkbare „intelligente Produkte“ sind mit momentan existierenden Produktionsmethoden nicht oder nicht kosteneffizient herzustellen. Dazu zählen unter anderem individualisierte Produkte mit direkt integrierten  Sensoren, LEDs, OLEDs, Displays etc.  Additive Fertigungsmethoden bieten sich...+
Die großflächige  Nanostrukturierung von Oberflächen ist eine zentrale Herausforderung für die Nanoimprint-Lithographie. Das Forschungsprojekt RollerNIL  hat das Ziel  komplexe optische Strukturen großflächig zu replizieren. Das soll mit Hilfe von Rolle-basierten Nanoimprintverfahren erm...+
PROFACTOR erforscht im Projekt e-Paper wall gemeinsam mit sechs internationalen Projektpartnern Electrowetting-Technologien. Damit sollen energetisch hocheffiziente Anzeigelösungen realisiert werden. Elektrische Energie soll nur für das Umschalten der Bildinformation auf dem Displayerforderlich se...+
Für die Nanoimprint-Lithographie sind das Stempelmaterial, das Imprintmaterial und das Substrat von entscheidender Bedeutung. Das Forschungsprojekt NILmaterials ist ein Projekt im Rahmen des NILaustria-Clusters. PROFACTOR erforscht in dem Projekt Materialien die sich von den bislang verfügbaren Ma...+
Graphen – eine Atomlage Graphit (C) – zeichnet sich durch hervorragende physikalische, chemische und thermische Eigenschaften aus. Es ist mehr als 100 Mal  zugfester als Stahl sowie extrem wärme- und elektrizitätsleitend. Graphen kann unter anderem in der Elektronikindustrie zum Einsatz komme...+
Im Mittelpunkt des Projekts SolarTrap stehen stehen theoretische und experimentelle Studien zur Manipulation von Licht in organischen Halbleitern. In den letzten Jahrzehnten haben organische Halbleiter großes Interesse hervorgerufen, da eine zur einfachen und kostengünstigen Herstellung von leistu...+

Publikationen

M.J. Haslinger, M.A. Verschuuren, R. van Brakel, J. Danzberger, I. Bergmair, M. Mühlberger; Stamp degradation for high volume UV enhanced substrate conformal imprint lithography (UV SCIL), Microelectronic Engineering Volume 153, 5 March 2016, Pages 66–70, doi: 10.1016/j.mee.2016.01.018

Lin Dong, Michael J. Haslinger, Jürgen Danzberger, Iris Bergmair, Kurt Hingerl, Calin Hrelescu, and Thomas A. Klar; Giant Cross Polarization in a Nanoimprinted Metamaterial Combining a Fishnet with its Babinet complement, Optics Express Vol. 23, Issue 15, pp. 19034-19046 (2015) •doi: 10.1364/OE.23.019034

Milka M. Jakovljević, Goran Isić, Babak Dastmalchi, Iris Bergmair, Kurt Hingerl and Radoš Gajić; Polarization-dependent optical excitation of gap plasmon polaritons through rectangular hole arrays, Appl. Phys. Lett. 106 (2015) 143106; [http://dx.doi.org/10.1063/1.4917510

Thomas Köpplmayr, Lukas Häusler, Iris Bergmair, Michael Mühlberger; Nanoimprint lithography on curved surfaces prepared by fused deposition modelling, Surf. Topogr.: Metrol. Prop. 3 (2015) 024003

Mühlberger, M. Rohn, J. Danzberger, E. Sonntag, A. Rank, L. Schumm, R. Kirchner, C. Forsich, S. Gorb, B. Einwögerer, E. Trappl, D. Heim, H. Schift, I. Bergmair; UV-NIL fabricated bio-inspired inlays for injection molding to influence the friction behaviour of ceramic surfaces, Microelectronic Engineering 141 (2015) 140-144 (free download for limited time here)

Kirchner, V. A. Guzenko, M. Rohn, E. Sonntag, M. Muehlberger, I. Bergmair, H. Schift; Bio-inspired 3D funnel structures made by grayscale electron-beam pattering and selective topography equilibration, Microelectronic Engineering 141 (2015) 107 – 111

Sabrina Weigl, Klaus Bretterbauer, Günter Hesser, Wolfgang Schöfberger, Christian Paulik; Synthesis, characterization, and description of influences on the stabilizing activity of antioxidant-functionalized multi-walled carbon nanotubes, Carbon 81 (2015) 305-331, [doi:10.1016/j.carbon.2014.09.061

Simon Waid, Heinz Wanzenböck, Michael Mühlberger, Marco Gavagnin, Emmerich Bertagnolli; Focused ion beam direct patterning of hardmask layers, J. Vac. Sci. Technol. B 32, 041602 (2014); [http://dx.doi.org/10.1116/1.4884777

Simon Waid, Heinz Wanzenböck, Michael Mühlberger, Marco Gavagnin, Emmerich Bertagnolli; Generation of 3D Nanopatterns with Smooth Surfaces, Nanotechnology 25 (2014) 315302. [doi:10.1088/0957-4484/25/31/315302

Dipu Borah, Claudia D. Simao, Ramsankar Senthamaraikannan, Sozaraj Rasappa, Achille Francone, Olivier Lorret, Mathieu Salaun, Barbara Kosmala, Nikolaos Kehagias, Marc Zelsmann, Clivia M. Sotomayor-Torres, Michael A. Morris; Soft-graphoepitaxy using nanoimprinted polyhedral oligomeric silsesquioxane substrates for the directed self-assembly of PS-b-PDMS, European Polymer Journal, Volume 49, Issue 11, November 2013, Pages 3512-3521

Simon Waid, Heinz D. Wanzenboeck, Marco Gavagnin, Ruppert Langegger, Michael Muehlberger, and Emmerich Bertagnolli; Focused ion beam induced Ga-contamination—An obstacle for UV-nanoimprint stamp repair?, J. Vac. Sci. Technol. B 31, 041602 (2013); [http://dx.doi.org/10.1116/1.4813025

Mathieu Salaun, Marc Zelsmann, Sophie Archambault, Dipu Borah, Nikolaos Kehagias, Claudia Simao, Olivier Lorret, Matthew T. Shaw, Clivia M. Sotomayor Torres and Mickael A. Morris; Fabrication of highly ordered sub-20nm silicon nanopillars by block copolymer lithography combined with resist design, J. Mater. Chem. C 1 (2013) 3544-3550 DOI: 10.1039/C3TC30300D

Thomas W. H. Oates, Babak Dastmalchi, Christian Helgert, Lars Reissmann, Uwe Huebner, Ernst-Bernhard Kley, Marc A. Verschuuren, Iris Bergmair, Thomas Pertsch, Kurt Hingerl, and Karsten Hinrichs; Optical activity in sub-wavelength metallic grids and fishnet metamaterials in the conical mount, Optical Materials Express 3(4) 439-451 (2013) [http://dx.doi.org/10.1364/OME.3.000439

Michael Mühlberger, Hannes Fachberger, Iris Bergmair, Michael Rohn, Bernd Dittert, Rainer Schöftner, Thomas Rothländer, Dieter Nees, Ursula Palfinger, Anja Haase, Alexander Fian, Martin Knapp, Claudia Preininger, Gerald Kreindl, Michael Kast, Thomas Fromherz; Nanoimprint Activities in Austra in the research project cluster NILaustria, Proc. SPIE. 8352, 28th European Mask and Lithography Conference 83520O (April 16, 2012) doi: 10.1117/12.921324

Iris Bergmair, Wolfgang Hackl, Maria Losurdo, Christian Helgert, Goran Isic, Michael Rohn, Milka M Jakovljevic, Thomas Mueller, Maria Giangregorio, Ernst-Bernhard Kley, Thomas Fromherz, Rados Gajic, Thomas Pertsch, Giovanni Bruno and Michael Muehlberger; Nano- and microstructuring of graphene using UV-NIL, Nanotechnology 23 (2012) 335301 (6pp) doi:10.1088/0957-4484/23/33/335301

Simao, A. Francone, D. Borah, O. Lorret, M. Salaun, B. Kosmala, M. T. Shaw, B. Dittert, N. Kehagias, M. Zelsmann, M. A. Morris, and C. M. Sotomayor Torres,; Soft Graphoepitaxy of Hexagonal PS-b-PDMS on Nanopatterned POSS Surfaces fabricated by Nanoimprint Lithography, Journal of Photopolymer Science and Technology 25(2) 239-244 (2012)

Waid, H.D. Wanzenboeck, M. Muehlberger, E. Bertagnolli; Optimization of 3D patterning by Ga implantation and reactive ion etching (RIE) for nanoimprint lithography (NIL) stamp fabrication, Microelectronic Engineering 97 (2012) 105-108 link

Lausecker, M. Grydlik, M. Brehm, I. Bergmiar, M. Mühlberger, T. Fromherz, G. Bauer; Anisotropic remastering for reducing features sizes on UV nanoimprint lithogrphy replica molds, Nanotechnology 23 (2012) 165302 (5pp)

Claudia Preininger, Ursula Sauer, Mustapha Chouiki, Rainer Schöftner; Nanostructures in protein chips: Effect of print buffer additive and wettability on immobilization and assay performance, Microelectronic Engineering 88 (2011) 1856-1859 [http://dx.doi.org/10.1016/j.mee.2011.01.040

Nikolaos Kehagias, Marc Zelsmann, Mustapha Chouiki, Achille Francone, Vincent Reboud, Rainer Schoeftner, Clivia Sotomayor Torres; Low temperature direct imprint of polyhedral oligomeric silsesquioxane (POSS) resist, Microelectronic Engineering 88 (2011) 1997-1999;   [http://dx.doi.org/10.1016/j.mee.2011.02.047

I Bergmair, B Dastmalchi, M Bergmair, A Saeed, W Hilber, G Hesser, C Helgert, E Pshenay-Severin, T Pertsch, E B Kley, U Hübner, N H Shen, R Penciu, M Kafesaki, C M Soukoulis, K Hingerl, M Muehlberger and R Schoeftner; Single and multilayer metamaterials fabricated by nanoimprint lithography, Nanotechnology 22 (2011) 325301 [http://dx.doi.org/10.1088/0957-4484/22/32/325301

Muehlberger, M. Boehm, I. Bergmair, M. Chouiki, R. Schoeftner, G. Kreindl, M. Kast, D. Treiblmayr, T. Glinsner, R. Miller, E. Platzgummer, H. Loeschner, P. Joechl, S. Eder-Kapl, T. Narzt, E. Lausecker, T. Fromherz; Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5 nm hp, Microelectronic Engineering 88 (2011) 2070–2073;    [http://dx.doi.org/10.1016/j.mee.2008.11.020

Lausecker, M. Brehm, M. Grydlik, F. Hackl, I. Bergmair, M. Mühlberger, T. Fromherz, F. Schäffler, and G. Bauer; UV nanoimprint lithography for the realization of large-area ordered SiGe/Si(001) island arrays, Appl. Phys. Lett. 98, 143101 (2011);    [http://link.aip.org/link/doi/10.1063/1.3575554

Iris Bergmair, Michael Mühlberger, Kurt Hingerl, Ekaterina Pshenay-Severin, Thomas Pertsch, Ernst Bernhard Kley, Holger Schmidt, Rainer Schöftner; 3D materials made of gold using Nanoimprint Lithography, Microelectronic Engineering 87 (2010) 1008-1010

Bergmair, M. Mühlberger, E. Lausecker, K. Hingerl and R. Schöftner; Diffusion of thiols during microcontact printing with rigid stamps, Microelectronic Engineering 87 (5-8) 2010,848-850

Jannesary, I. Bergmair, S. Zamiri, K. Hingerl; Nano-silicon based photonic crystal stamps with electron beam lithography (EBL) technology, Proc. SPIE, Vol. 7643, 76431X (2010)

Wanzenböck, S. Waid, E. Bertagnolli, M. Mühlberger, I. Bergmair, R. Schöftner; NIL stamp modification utilizing focused ion beams, Journal of Vacuum Science and Technology B 27 (6) 2009 2679-2685

Bergmair, M. Mühlberger, W. Schwinger, K. Hingerl, E.-B. Kley, H. Schmidt, R. Schöftner; Reversal µCP using hard stamps, Microelectronic Engineering 86 (4-6) 2009 650-653

Klukowska, A. Kolander, I. Bergmair, M. Mühlberger, H. Leichtfried, F. Reuther, G. Grützner, R. Schöftner; Novel transparent hybrid polymer working stamp for UV-imprinting, Microelectronic Engineering 86 (4-6) 2009 697-699

Mühlberger, I. Bergmair, A. Klukowska, A. Kolander, H. Leichtfried, E. Platzgummer, H. Löschner; UV-NIL with working stamps made from Ormostamp, Microelectronic Engineering 86 (4-6) 2009 691-693

M.T. Troya, F. Rubio, M.J. Prieto, D. Lorenzo, J.L. Fernández-Cabo, R. Schöftner; Natural durability of reed (Phragmites australis) against wood decay organisms: relation to other forest species, Investigación Agraria, Sistemas y Recursos Forestales 18 (3) 2009

Haubner, W. Schwinger, J. Haring, R. Schöftner; Sol-gel preparation of catalyst particles on substrates for hot-filament CVD nanotube deposition, Diamond and Related Materials 17 (7-10) 2008 1452-1457

I.Bergmair, M. Mühlberger, M. Gusenbauer, R. Schöftner, Kurt Hingerl; Equalising stamp and substrate deformations in solid parallel-plate UV-based nanoimprint lithography, Microelectronic Engineering 85 (5-6) 2008 822-824

Schwinger, E. Lausecker, I. Bergmair, M. Grydlik, T. Fromherz, C. Hasenfuß, R. Schöftner; Fabrication of nano-gold islands with [mu]m spacing using 2.5 dimensional PDMS stamps, Microelectronic Engineering 85 (5-6) 2008 1346-1349

E Lausecker, W Schwinger, I Bergmair, M Mühlberger and R Schöftner; Large area μm and sub-μm structuring of gold layers with microcontact printing using 4″ and 1″ PDMS stamps, Journal of Physics: Conference Series 100 (2008) 052024

W Schwinger, J Haring, A Jantscher, R Haubner, I Gerger, M Bodnarchuk, M Kovalenko, W Heiss and R Schöftner; Preparation of catalytic nano-particles and growth of aligned CNTs with HF-CVD, Journal of Physics: Conference Series 100 (2008) 052092

I Bergmair, M Mühlberger, M Gusenbauer, R Schöftner, T Glinsner, and K Hingerl; Effects of a compliant layer in solid parallel-plate UV-based nanoimprint lithography, Journal of Physics: Conference Series 100 (2008) 042001

Anna Klukowska, Marko Vogler, Anett Kolander, Freimut Reuther, Gabi Gruetzner, Michael Muehlberger, Iris Bergmair, Rainer Schoeftner; Alternative Approach to Transparent Stamps for UV-based Nanoimprint Lithography – Techniques and Materials, Proc. of SPIE Vol. 6792 67920J-1

Mühlberger, I. Bergmair, W. Schwinger, M. Gmainer, R. Schöftner, T. Glinsner, Ch. Hasenfuß, K. Hingerl, M. Vogler, H. Schmidt, E.B. Kley; A Moire method for high accuracy alignment in nanoimprint lithography, Microelectronic Engineering 84 (5-8) 2007 925-927

Glinsner, P. Lindner, M. Mühlberger, I. Bergmair, R. Schöftner, K. Hingerl, H. Schmid, E.-B. Kley; Fabrication of 3D-photonic crystals via UV-nanoimprint lithography, Journal of Vacuum Science and Technology B 25 (2007) 2337

Grigaliunas, S. Tamulevicius, M. Mühlberger, G. Mittendorfer, T. Glinsner, G. Zakas, S. Meskinis, A. Guobiene, A. Palevicius, G. Janusas; Imprint lithography for large scale angular encoders, Materials Science 13 Issue 2 (2007) 103-106

Vogler, S. Wiedenberg, M. Mühlberger, I. Bergmair, T. Glinsner, H. Schmidt, E. Kley, G. Grützner; Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography, Microelectronic Engineering 84 5-8 (2007) 984-988

Mehnen, E. Kaniusas, J. Kosel, H. Pfützner, T. Meydan, M. Vazquez, M. Rohn, A.M. Merlo, B. Marquardt, S. Sauermann; Functional electrical stimulation monitoring by bending sensitive magnetostrictive bilayer sensors, International Journal of Applied Electromagnetics and Mechanics 25 Number 1-4 (2007) 485-488

Kosel, H. Pfützner, S. Traxler, E. Kaniusas, L. Mehnen, T. Meydan, M. Vazquez, M. Rohn, A.M. Merlo, B. Marquardt; Contactless detection of bending sensitive magnetostrictive bilayers utilizing higher harmonics, International Journal of Applied Electromagnetics and Mechanics Volume 25, Number 1-4 (2007)

Vázquez, G. Badini, K. Pirota, J. Torrejón, A. Zhukov, A. Torcunov, H. Pfützner, M. Rohn, A. Merlo, B. Marquardt, T. Meydan; Applications of amorphous microwires in sensing technologies, International Journal of Applied Electromagnetics and Mechanics Volume 25, Number 1-4 (2007)

Pfützner, E. Kaniusas, J. Kosel, L. Mehnen, T. Meydan, F. Borza, M. Vázquez, M. Rohn, A.M. Merlo, B. Marquardt; First magnetic materials with sensitivity for the physical quantity “curvature”, Journal of Materials Processing Technology 181 Issues 1-3 (2007) 186-189

Grigaliūnas, S. Tamulevičius, M. Mühlberger, D. Jucius, A. Guobienė, V. Kopustinskas, A. Gudonytė; Nanoimprint Lithography Using IR Laser Irradiation, Applied Surface Science 253 Issue 2 (2006) 646-650

Kaniusas, H. Pfützner, L. Mehnen, J. Kosel, G. Varoneckas, A. Alonderis, T. Meydan, M. Vázquez, M.Rohn, A.M. Merlo, B. Marquardt; Magnetoelastic bilayer concept for skin curvature sensor, Ultragarsas („Ultrasound“ in Lithuanian) 52 Issue 3 (2004) 42-46

Schöftner, W. Buchberger; Systematic investigations of different capillary electrophoretic techniques for separation of methylquinolines, Journal of Separation Science 26 Issue 14 (2003) 1247-1252

Schöftner, W. Buchberger; Review: Determination of low-molecular-mass quternary ammonium compounds by capillary electrophoresis and hyphenation with mass spectrometry, Electrophoresis 24 Issue 12-13 (2003) 2111-2118

Mühlberger et al.; NIL and additive manufacturing – a vision, MNE2016

Mühlberger; Nanoimprinting for Life Sciences, SAMOSS Summerschool 2016

Faury et al.; Nanofabrication at Profactor, Nanopia 2015

Mühlberger et al.; Mikro- und Nanostrukturierung von Oberflächen im Kontext der additiven Fertigung, 4. Smart Textiles Symposium, Internet of Textile Things

I. Bergmair et al.; Nanoimprint Lithography for applications in optics, life sciences and electronics,

M. Mühlberger, L. Häusler, E. Lausecker, J. Danzberger, B. Einwögerer, T. Müller, W. Hackl, M. Glaser, F. Schäffler, T. Fromherz, I. Bergmair; Nanoimprinting for optoelectronic device applications, SUSS Technology Forum Nanoimprint

Mühlberger; Nanofabrication Technologies for Scaled Roll-to-Roll and Print Manufacturing, An Academic-Industry Workshop on Technologies for U.S.-EU Collaborations on Nanofabrication Technologies for Scaled Roll-to-Roll and Print Manufacturing

Mühlberger, O. Lorret, I. Bergmair, J. Kastner, B. Einwögerer; Functional Nanomaterials for Nanoimprint Lithography, CHInano 2013

Mühlberger et al.; Digital Printing on 3D Printed Surfaces, Add+it 2016

J. Haslinger, T. Köpplmayr, T. Faury, T. Fischinger, L. Häusler and M. Mühlberger; Soft nanoimprint lithography on 3D printed curved surfaces, NNT2016

Mühlberger, H. Außerhuber, L. Häusler, M. Behrens, S. Wögerer, H. Fachberger, T. Lederer, S. Ruttloff, D. Nees, A. Prinz, P. Taus, M. Schinnerl, H. D. Wanzenboeck, J.-P. Perrin, M. Panholzer, K. Hingerl, C. Neuhauser; UV-based Nanoimprint Lithography of T-shaped Nanostructures, NNT2016

Mühlberger, S. Ruttloff, A. Prinz, P. Taus, J.-P. Perrin, C. Neuhauser, M. Behrens, H. Ausserhuber, L. Häusler, S. Wögerer, M. Panholzer, H. Wanzenböck; Nanoimprint Lithography of T-shaped Nanostructures, MNE2016

Andreas Tröls, Bernhard Jakoby, Leif Yde, Jan Stensborg, Thomas Voglhuber, Wolfgang Hackl, Michael Mühlberger, Thomas Lederer, Thomas Fischinger; Roll to plate production of gravity driven, micro fluidic sensors based on electrowetting on dielectrics, MNE2016

Hybride Fertigung; M. Mühlberger et al., ISS „Die Zukunft der Produktion“

Leif Yde, Jan Stensborg, Thomas Voglhuber, Wolfgang Hackl, Helene Außerhuber, Stephanie Wögerer, Lars Lindvold, Thomas Fischinger, Michael Mühlberger; A Roll-to-Plate UV-nanoimprint tool for micro and nano-optical applications, EMLC216

Mühlberger et al.; Nanoimprinting and Additive Manufacturing – An interesting combination?, NILindustrialday2016

Köpplmayr, M. Maslinger, M. Mühlberger; Nanoimprinting on 3D printed surfaces,

Lin Dong, Michael J. Haslinger, Jürgen Danzberger, Iris Bergmair, Kurt Hingerl, Calin Hrelescu, and Thomas A. Klar; Giant Cross Polarization in a Nanoimprinted Metamaterial Combining a Fishnet with its Babinet complement, SPIE Photonics West

Mühlberger; Additive Micro- and Nanomanufacturing, Add+it 2015

M.J. Haslinger, J. Danzberger, T.A. Klar, C. Hrelescu, I Bergmair; Optical characterization of large area metamaterials fabricated using UV-based nanoimprint lithography, Metamaterials 2015

Häusler, T. Köpplmayr, T. Faury, T. Fischinger, J. Danzberger, T. Voglhuber, M. Haslinger and M. Mühlberger; Challenges for Nanoimprinting for Additive Manufacturing and on Complex Surfaces, NILindustrialday 2015

Bergmair, U. Palfinger, T. Glinsner, M. Mühlberger; Opportunities for nanoimprinting – the Austrian perspective,

Marco Lindner, Julia Kastner, Eva Sevcsik, Martin Fölser, Gerhard Schütz and Iris Bergmair; nano-patterning of proteins to study molecular interactions of in vivo membrane proteins, nanofis

T. Köpplmayr, L. Häusler, I. Bergmair, M. Mühlberger; Nanoimprint Lithography on Freeform Surfaces prepared by Fused Deposition Modeling, euSPEN Special Interest Group Meeting Structured and Freeform Surfaces

M. Mühlberger et al.; Nanostructuring using Nanoimprint Lithography, nanoNET.at meeting

Häusler, B. Einwögerer, W. Hackl, T. Fromherz, M. Losurdo, G. Bruno, N. Rupesinghe, S. Schuler, M. Furchi, T. Müller, B. Kley, W. Rockstroh, I. Bergmair, M. Mühlberger; Parallel fabrication of graphene-based devices by UV-NIL, NNT2014

Kirchner, H. Schift, M. Rohn, I. Bergmair, M. Mühlberger; Fabrication of biomimetic replications masters and mobility based full 3D reflow simulation, NNT2014

L. Häusler, B. Einwögerer, W. Hackl, T. Fromherz, M. Losurdo, G. Bruno, N. Rupesinghe, S. Schuler, M. Furchi, T. Müller, B. Kley, W. Rockstroh, M. Mühlberger, I. Bergmair; Parallel fabrication of graphene-based devices by Ultraviolet Nanoimprint Lithography, MNE 2014 – The 40 th International Conference on Micro and Nano Engineering

L. Häusler, J. Danzberger, B. Einwögerer, I. Bergmair, M. Mühlberger, M. Humer, R. Guider, E. Lausecker, T. Fromherz; Cloning of a fully functional Si-based photonic integrated circuit by ultraviolet nanoimprint lithography, EIPBN 2014

Lausecker Elisabeth, Danzberger Jürgen, Häusler Lukas, Bergmair Iris, Mühlberger Michael, Glaser Martin, Schäffler Friedrich, Fromherz Thomas; 4 inch ultraviolet nanoimprint lithography for the detailed understanding of silicon-germanium island nucleation on pit-patterned silicon substrates, MNE2013

B. Unterauer, M. Rohn, M. Mühlberger; Characterization of Functionalized, Magnetic Nanoparticles, nanoBio&Med2013

Michael Mühlberger, Hannes Fachberger, Iris Bergmair, Michael Rohn, Bernd Dittert, Rainer Schöftner, Christian Wögerer, Thomas Rothländer, Dieter Nees, Alexander Fian, Ursula Palfinger, Anja Haase, Martin Knapp, Claudia Preininger, Gerald Kreindl, Michael Kast, Thomas Fromherz; Nanoimprint Activities in Austria in the Research Project Cluster NILaustria, NILindustrialday2013

Bergmair, O. Lorret, B. Unterauer, B. Einwögerer, A. Rank, B. Dittert, M. Rohn, M. Mühlberger; Micro- and nanostructures fabricated by NIL for applications in optics, lifesciences and self-organisation, NILindustrialday2013

Olivier Lorret, Julia Kastner, Bernd Dittert, Mathieu Salaün, Marc Zelsmann, Barbara Kosmala, Michael A. Morris, Michael Mühlberger; Multi-functionalized Polyhedral Oligomeric Silsesquioxane (POSS): Promising Materials for surface chemistry., Hybrid Materials 2013

Leif Yde, Jan Stensborg, Thomas Voglhuber, Wolfgang Hackl, Helene Außerhuber, Stephanie Wögerer, Lars Lindvold, Thomas Fischinger, Michael Mühlberger; Roll-to-Plate UV-Nanoimprinting for Micro and Nano-Optics, NNT2016

M.J. Haslinger, H. Leichtfried, M. Messerschmidt, M.W. Thesen, L. Häusler and M. Mühlberger; Metal nano-pattern fabrication by applying a soft UV-NIL resist onto a neutral developable lift-off layer, NNT2016

Mühlberger, M. J. Haslinger, T. Köpplmayr, A. Fuchsbauer, M. Ikeda, L. Häusler, H. Außerhuber, T. Faury, K. Bretterbauer, H. Leichtfried, V. Tober, T. Voglhuber, P. Meyer-Heye, M. Ankerl, S. Zambal, C. Wögerer, T. Lederer, H. Fachberger; Could Nanoimprinting and Additive Manufacturing be an Interesting Combination?, NNT2016

Leif Yde, Jan Stensborg, Thomas Voglhuber, Wolfgang Hackl, Helene Außerhuber, Stephanie Wögerer, Lars Lindvold, Thomas Fischinger, Michael Mühlberger; A Roll-to-Plate UV-nanoimprint tool for micro and nano-optical applications, MNE2016

M.J. Haslinger, H. Leichtfried, M. Messerschmidt, M.W. Thesen, L. Häusler and M. Mühlberger; Metal nano-pattern fabrication by applying a soft UV-NIL resist onto a neutral developable lift-off layer, MNE2016

Häusler, M. Haslinger et al.,; Direct fabrication of plasmon-magnetic nanoparticles for biomolecular sensing by UV-NIL and lift-off, MNE2016

Shoshi, J. Schinerl, G. Kovacs, T. Glatzl, L. Häusler, M. Haslinger, M. Mühlberger, H. Brückl; Optical observation of the rotational dynamics of plasmon-magnetic nanoparticles for biomolecular sensing, MNE2016

Köpplmayr, L. Häusler, M. Mühlberger; Influence of stamp properties during imprinting on 3D printed surfaces, Micro and Nanoengineering 2015 MNE 2015

J. Haslinger, M. Verschuuren, R. van Brakel, J. Danzberger, I. Bergmair, M. Mühlberger; Stamp degradation and lifetime for UV-Curing Sol-Gel resist based SCIL, Nanoprint and Nanoimprint Technology 2015 NNT 2015

Mühlberger, A. Prinz, P. Taus, H. Ausserhuber, J. Danzberger, H. Wanzenböck; Investigation of stamp materials for the UV-NIL replication of T-shaped nanostructures, Nanoprint and Nanoimprint Technology 2015 NNT 2015

Limbeck, E. Weigl, C. Feyrer, T. Fischinger, J. Danzberger, T. Voglhuber, J. Korak, M. Mühlberger; Material flow tracking during UV-NIL step&repeat stamp replication, Nanoprint and Nanoimprint Technology 2015 NNT 2015

Köpplmayr, L. Häusler, M. Mühlberger; The influence of stamp properties during imprinting on 3D printed curved surfaces, Nanoprint and Nanoimprint Technology 2015 NNT 2015

Michael Mühlberger, Michael J. Haslinger, Michael Jurisch, Jürgen Danzberger, Thomas Fischinger, Mathias Irmscher; Mesa working stamps fabricated from borderless mesa masters for step&repeat UV-NIL stamp replication, Nanoprint and Nanoimprint Technology 2015 NNT 2015

Martin Fölser, Marco Lindner, Julia Kastner, Eva Sevcsik, Iris Bergmair, Bernd Dittert, Gerhard Schütz; Pushing micropatterning to the nanoscale, Linz Winter Workshop 2015

Lin Dong, Michael Haslinger, Calin Hrelescu, Jürgen Danzberger, Iris Bergmair and Thomas A. Klar; Plasmonic Mode Coupling in a Nanoimprinted Metamaterial, Nanometa 2015

Danzberger Jürgen, Panholzer Martin, Obermayr Markus, Hingerl Kurt and Bergmair Iris; Surface Modification of Mg Materials based on Ultra Violet Imprint Lithography for Faster Kinetics in H2 De- and Absorption, MH2014

Danzberger, L. Häusler, E. Lausecker, I. Bergmair, M. Glaser, F. Schäffler, T. Fromherz, M. Mühlberger; Large-area ultraviolet nanoimprint lithography for the detailed understanding of silicon-germanium island growth on pit-patterned silicon substrates, NNT2014

Haslinger, L. Häusler, K. Bretterbauer, I. Bergmair, M. Mühlberger; The influence of surface energies on the working stamp fabrication for UV-based Nanoimprint Lithography, NNT2014

Danzberger, M. Haslinger, T. Fischinger, L. Häusler, B. Einwögerer, K. Bretterbauer, T. Faury, W. Hackl, I. Bergmair, M. Mühlberger; Influencing factors for the fabrication of square working stamps for UV-based Nanoimprint Lithography, NNT2014

Lindner, J. Kastner, O. Lorret, E. Sevcsik, M. Fölser, G. Schütz, I. Bergmair; Nanoscale Patterning of Proteins for Understanding Molecular Interactions of Membrane Proteins In Living T-Cells, NNT2014

Rohn, J. Danzberger, E. Sonntag, C. Forsich, R. Kirchner, A. Rank, B. Einwögerer, M. Mühlberger, E. Trappl, D. Heim, H. Schift, I. Bergmair; UV-NIL fabricated bio-inspired inlays for injection molding to influence the friction behaviour of ceramic surfaces, MNE 2014 – The 40 th International Conference on Micro and Nano Engineering

Kirchner, H. Schift, M. Rohn, E. Sonntag, M. Mühlberger; Bio-inspired 3D funnel structures made by electron-beam pre-patterning and thermal self-perfection, MNE 2014 – The 40 th International Conference on Micro and Nano Engineering

Danzberger, M. Lindner, S. Kopp, M. Panholzer, M. Obermayr, K. Hingerl and I. Bergmair; Surface Modification of Mg Materials Based on Ultra Violet Imprint Lithography for Faster Kinetics in H2 De- and Absorption, MNE 2014 – The 40 th International Conference on Micro and Nano Engineering

Danzberger, L. Häusler, E. Lausecker, I. Bergmair, M. Glaser, F. Schäffler, T. Fromherz, M. Mühlberger; Large-area ultraviolet nanoimprint lithography for the detailed understanding of silicon-germanium island growth on pit-patterned silicon substrates, MNE 2014 – The 40 th International Conference on Micro and Nano Engineering

Haslinger, L. Häusler, K. Bretterbauer, M. Mühlberger, I. Bergmair; The influence of wetting behaviour on the working stamp fabrication for UV-based Nanoimprint Lithography, MNE 2014 – The 40 th International Conference on Micro and Nano Engineering

Marco Lindner, Julia Kastner, Olivier Lorret, Eva Sevcsik, Martin Fölser, Gerhard Schütz, Iris Bergmair; Nanoscale patterning of proteins, MNE 2014 – The 40 th International Conference on Micro and Nano Engineering

Lukas Häusler, Barbara Einwögerer, Wolfgang Hackl, Thomas Fromherz, Maria Losurdo, Giovanni Bruno, Nalin Rupesinghe, Christoph Giesen, Michael Heuken, Thomas Müller, Ernst-Bernhard Kley, Werner Rockstroh, Michael Mühlberger and Iris Bergmair; Fabrication of graphene-based devices by Ultraviolet Nanoimprint Lithography, EIPBN 2014

Jürgen Danzberger, Lukas Häusler, Iris Bergmair, Michael Mühlberger, Elisabeth Lausecker, Martin Glaser, Friedrich Schäffler and Thomas Fromherz; Large-area ultraviolet nanoimprint lithography for the detailed understanding of silicon-germanium island nucleation on pit-patterned silicon substrates, EIPBN 2014

Barbara Unterauer, Julia Kastner, Christina Manner, Olivier Lorret, Bernd Dittert, Gerhard Schütz, Michael Mühlberger; Novel NIL material: Investigation on forces between stamp material and protein, Linz WinterWorkshop 2014

Iris Bergmair, Barbara Einwögerer, Barbara Unterauer, Andreas Rank, Michael Mühlberger, Manuela Wagner, Manfred Koranda, Adrian Prinz, Georg Bauer; Selective epoxy functionalization of patterned polystyrene for bioscience applications, MNE2013

Lorret, E. Lausecker, L. Häusler, B. Einwogerer, I. Bergmair, T. Fromherz, M. Mühlberger; Si etching with imprinted POSS structures, MNE2013

Rohn, A. Rank, J. Danzberger, B. Einwögerer M. Mühlberger, D. Heim, C. Forsich, E. Sonntag, E. Trappel; UV-NIL replicates as mold inlays for Powder Injection Molding, NNT2013

Lorret, L. Häusler, B. Einwögerer, M. Mühlberger, E. Lausecker, T. Fromherz; POSS resists with high etching resistance, NNT2013

Häusler, R. Guider, E. Lausecker, M. Humer, J. Danzberger, B. Einwögerer, O. Lorret, I. Bergmair, M. Mühlberger, T. Fromherz; Cloning of Si waveguides and resonators by nanoimprint technology, NNT2013

Lausecker, F. Hackl, M. Glaser, R. Jannesari, F. Schäffler, T. Fromherz, I. Bergmair, M. Mühlberger; Si photonic crystal with aligned SiGe islands, NNT2013

Danzberger, B. Einwögerer, L. Häusler, I. Bergmair, M. Mühlberger, E. Lausecker, M. Glaser, F. Schäffler, T. Fromherz; Large area UV-nanoimprint lithography patterning on silicon – substrates for the investigation of quantum dots growth, NNT2013

Iris Bergmair, Barbara Einwögerer, Wolfgang Hackl, Thomas Fromherz, Maria Losurdo, Giovanni Bruno, Nalin Rupesinghe, Christoph Giesen, Michael Heuken, Thomas Müller, Bernhard Kley, Werner Rockstroh, Michael Mühlberger; Nanoimprint Lithography for Fabrication of Graphene based Devices, NNT2013

Julia Kastner, Iurii Gnatiuk, Barbara Unterauer, Olivier Lorret, Iris Bergmair, Barbara Einwögerer, Michael Rohn, Dieter Holzinger, Michael Mühlberger; Liquid Phase Exfoliation of Graphite in Alcohols: Fabrication of Graphene/Graphite Flakes, NNT2013

M. Rohn, A. Rank, D. Heim, C. Forsich, E. Sonntag, E. Trappl; UV-NIL replicates as mold inlays for Ceramic Injection Molding, HARMNST 2013

J. Kastner, O. Lorret, A. Rank, B. Dittert, R. Schöftner, C. Schwarzinger, M. Mühlberger; Epoxy-Acid Bi-functionalized Polyhedral Oligomeric Silsesquioxanes as Stamp Material for Nanocontact Printing Application, Hybrid Materials 2013

B. Unterauer, M. Rohn, M. Mühlberger; Nanoparticle Characterization with AFM, Linz WinterWorkshop 2013

Ihr Ansprechpartner

Dr. Michael Mühlberger
Functional Surfaces and Nanostructures

+43 7252 885 253
michael.muehlberger@nullprofactor.at

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