NIL Metrology Service

NIL Characterisation as a Service

Precise and reproducible nanoimprint lithography depends on the accurate characterization of surfaces, layer thicknesses, and micro- and nanostructures.

With many years of experience and state-of-the-art metrology infrastructure, we provide comprehensive analysis across a broad range of parameters to support your project.

 

Advanced metrology equipment

• Atomic Force Microscope (AFM) – Bruker Dimension Edge: High-resolution surface topography at the nanoscale.
• Optical Microscope – Keyence VHX-5000: Flexible optical inspection with deep focus imaging.
• Profilometer – Veeco Dektak 150: Accurate step height and film thickness measurements.
• Plasma Cleaner – Diener NANO: Surface cleaning and activation for improved material adhesion.
• Ellipsometer – Sentech: Measurement of thin film thickness and refractive index.
• 3D Laser Scanning Microscope – Keyence VK-X3000: High-resolution, true-color 3D imaging of microstructures.
• Contact Angle Measurement System – Krüss DSA100: Surface energy and wettability analysis.
• UV/Vis Spectrometer: Spectral analysis of transmission and absorption of thin films.
• Angle-dependent Reflection and Transmission Setup (our own development): Characterization of optical behavior at variable incident angles.

 

 

Our metrology services are tailored to the specific needs of nanoimprint lithography — from substrate preparation to process monitoring and final quality control.