PROFACTOR has many years of experience in the production of NIL coatings and offers the following materials. These materials have been used successfully by many customers for years.

HMNP-12- Adhesion Layer for Nanoimprint Materials

Adhesion Layer for Working Stamp Materials

In the last years a lot of effort was put into the development of working stamp materials for Nanoimprint Lithography. There are different types of working stamp materials like Ormoceres or Perfluorinated Polyether (PFPE). For all those materials an adhesion promoter is needed to improve the adhesion of the working stamp material to the backplane of Silicon, Quartz or Glass.

Drop & Spin

Our adhesion promoter is spin-coated onto the glass or silicon backplane. Just put your backplane in your coating equipment, dispense HMNP-12 and turn on your spin coater. After softbake the backplane is ready for working stamp replication.

Low viscosity, less water sensitivity HMNP-12 provides an adhesion layer of few nm on your glass or silicon substrate. It is in comparison to other products less sensitive to water film on your substrates and humidity in air.

Properties

  • Fast and easy to apply
  • Low viscosity
  • Few nanometer thin layer
  • Adhesion promoter for PFPE materials as well as Ormoceres
  • Cost efficient
  • No special care needed regarding humidity in air
  • No special treatment of backplane before applying HMNP-12
  • Works on Silicon as well as Quartz and Glass

Anti Sticking Layer for Nanoimprint Stamps BGL-GZ-96

 

The easiest Anti Sticking Layer for your Stamps.

A critical step in a replication or Nanoimprint process is the separation of stamp and substrate after resist curing. To avoid sticking of the resist and stamp, the total surface energy of the stamp has to be minimized.

Sticky stamps?

BGL-GZ-96 provides a fast and easy anti-coating of your stamp. It has been tested for a broad range of applications, like the replication of microoptic devices.

Drop and Spin

  • BGL-GZ-96 is spin-coated in one minute onto a stamp, which is ready to use after 8 hours.
  • Just put your stamp in your coating equipment, dispense BGL-GZ-96 and turn on your spin coater.
  • 3 hours vs. 2 minutes
  • For BGL-GZ-96 only a spin coater is needed. Conventional anti-sticking layers have to be deposited from the vapor phase which takes several hours and requires sophisticated experimental setups.

Properties

  • Fast and easy to apply
  • Decreased stamp surface energy
  • Minimal sticking of resist to stamp
  • Cost efficient
  • Only a spin coater is needed
  • Process at room temperature
  • Process can be performed in air
  • From micrometer to nanometer applications*
  • BGL-GZ-96 is available in different size glass bottles, standard size is 250 ml

*) please test BGL-GZ-96 for suitability first, before applying it on an expensive master

What others say about our Anti Sticking Layer

Quote from a Nature article by Tomohiro Mori et.al.: https://www.nature.com/articles/s41467-023-41535-9

 

 

 

Other researchers citing our Anti Sticking material:

  • An, Minghao, et al. “Independent Control of Quality Factor and Circular Dichroism via Intrinsic Chiral Plasmonic Bound States in the Continuum.” Laser & Photonics Reviews: e01707. 2025
  • 赵晗彤, et al. “双光子聚合打印三维光子晶体的研究进展 (特邀).” Chinese Journal of Lasers 51.12 (2024): 1202402-1202402.
  • Kolar-Hofer, Pauline, et al. “Fabrication of nanoparticles with precisely controllable plasmonic properties as tools for biomedical applications.” Nanoscale 17.8 (2025): 4423-4438.
  • Wolf, Johannes, et al. “Novel approach of patterning technologies enabling monolithic micro-optical components.” Novel Patterning Technologies 2023. Vol. 12497. SPIE, 2023.
  • Haslinger, Michael J., et al. “Increasing the stability of isolated and dense high-aspect-ratio nanopillars fabricated using UV-nanoimprint lithography.” Nanomaterials 13.9 (2023): 1556.
  • Mühlberger, Michael M., et al. “Nanoimprinted hierarchical micro-/nanostructured substrates for the growth of cardiomyocyte fibers.” Nanomanufacturing 3.4 (2023): 416-433.
  • Cabello‐Olmo, Elena, et al. “Inkjet‐Printed and Nanopatterned Photonic Phosphor Motifs with Strongly Polarized and Directional Light‐Emission.” Advanced Functional Materials 33.51 (2023): 2305907.
  • Nowduri, Bharat, et al. “Advanced Biomimetic Nanostructured Microelectrode Arrays for Enhanced Extracellular Recordings of Enteric Neurons.” Advanced Materials Interfaces 10.16 (2023): 2300023.
  • Wang, Hao, et al. “Two‐photon polymerization lithography for optics and photonics: fundamentals, materials, technologies, and applications.” Advanced Functional Materials 33.39 (2023): 2214211.
  • Buhl, Janek, et al. “Two-dimensional nanograting fabrication by multistep nanoimprint lithography and ion beam etching.” Nanomanufacturing 1.1 (2021): 39-48.
  • Lütolf, Fabian, et al. “Wafer-scale replicated gratings for compressing ultrafast laser pulses at telecom wavelengths.” Optics Continuum 1.5 (2022): 1051-1059.
  • Muehlberger, Michael, et al. “Nanoimprint replication of biomimetic, multilevel undercut nanostructures.” Nanomaterials 11.4 (2021): 1051.
  • Baracu, Angela Mihaela, et al. “Silicon metalens fabrication from electron beam to UV-nanoimprint lithography.” Nanomaterials 11.9 (2021)
  • Kumar, Dinesh, et al. “High performing AgNW transparent conducting electrodes with a sheet resistance of 2.5 Ω Sq− 1 based upon a roll-to-roll compatible post-processing technique.” Nanoscale 11.12 (2019)

Your Contact

Christoph Brandstätter
Head of Business Development

+43 7252 885 252
solutions@nullprofactor.at