The aim of Nanoimprint Lithography (NIL) is the cost-efficient replication of nanostructures on large area surfaces.
In the context of additive manufacturing additive Nanoimprinting lends itself to the surface treatment of additively manufactured items and to the modification of these surfaces with custom-made functionalities.
PROFACTOR focuses in its research on UV-based nanoimprint lithography and several challenges:
- Nanoimprinting on curved surfaces (3DNIL): NIL, which was developed to be performed on surfaces as flat as possible has to be adapted to work on macroscopically curved surfaces. Applications of nanostructures on curved surfaces can range from antireflective structures on lenses to biomimetic structures on 3D-printed implants. We work on process- as well as on equipment-development to make these and many more applications possible.
- Nanoimprinting – multilayer and with different materials: We want to combine different nanoimprint materials with different functionalities to create novel effects and make new applications possible. The central point is the interaction of different materials in different layers for specific functionalities as well as layer-to-layer alignment. One of our goals is to combine these efforts with the inkjet deposition of the nanoimprint materials to allow digital pattern generation.
- Nanoinkjet printing – combination of inkjet printing and nanoimprinting: The aim is to improve the resolution of inkjet printing by preparing prestructured substrates by nanoimprinting and use the digital advantage of inkjet to make nanoimprinting digital.
- Roll-to-Plate Nanoimprinting: to achieve large area nanoimprinting we are working on processes for our roll-to-plate nanoimprint tool, which was established together with Stensborg A/S. We are able to work with substrates as large as 30x60cm². They can be rigid but also flexible and can also be non-transparent. In our lab tool we can use droplet dispensing, inkjet printing as well as slot die coating and manual coating methods.
- Material modifications: Materials may have to be modified to suit the requirements of additive processes. If necessary we adapt existing materials or material formulations to suit our or our customers’ needs.
Projects
Heart failure (HF) is the leading cause of death in Western countries and increasingly challenged by the shortage of donor organs. Contemporary mechanical circulatory support (MCS) devices promote survival and improve quality of life for many HF patients. Rotodynamic blood pumps (RBP) used as left v ...+
The electrocatalytic CO2 reduction reaction (CO2RR) is the most promising route for CO2 utilization, due to its efficiency, versatility, scalability and compatibility with renewable energies. BEES-4-CO2RR develops efficient, sustainable and up-scalable catalytic electrodes, inspired from nature and ...+
Finished Projects
The smart cities of the future are depending on the integration of smart or intelligent windows in buildings to ensure a high quality of living while conserving as much energy and resources as possible. As a part of the building that interacts with the outside, windows are responsible for more than ...+
The project NEAT will bring forth a cost-efficient fabrication process for advanced nanoelectrode arrays suitable for (automatized) drug-screening using tissue models grown on a chip. Advanced cell array technologies (e.g. multielectrode arrays (MEAs) or planar patch-clamp) have emerged as novel sta ...+
The M3dRES project aims at establishing a unique infrastructure devoted to 3d-printing for medical research in a strongly interdisciplinary environment. M3dRES provides essential tools for personalized patient treatment, for the enhancement of medical imaging, for the acceleration of tissue engineer ...+
The goal of LAMPION is the development of multifunctional hybrid nanoparticles with both magnetic and plasmonic properties. They will be used as nanoprobes in immunodiagnostics. The innovative breakthrough consists in the reliable production of hybrid nanoparticles by nanoimprint lithography and the ...+
Microfluidics deals with the behaviour, precise control and manipulation of fluids that are geometrically constrained to a small, typically sub-millimeter, scale at which capillary penetration governs mass transport. The benefits of miniaturization in biotechnology and biomedical applications are ...+
For nanoimprint lithography, the stamp material, the imprint material and the substrate are of decisive importance. The research project NILmaterials is a project within the NILaustria-Cluster. In this project, PROFACTOR is investigating materials that clearly stand out from the materials available ...+
PROFACTOR is researching electrowetting technologies together with six international project partners in the e-Paper wall project. The aim is to implement highly energy-efficient display solutions. Electrical energy should only be required for switching the image information on the display. Energy c ...+
Graphene - an atomic layer of graphite (C) - is characterized by excellent physical, chemical and thermal properties. It is more than 100 times more tensile strength than steel and is extremely heat and electricity conducting. Graphene can be used in the electronics industry, for example, to replace ...+
Large area Nanostructuring is one of the main challengens in Nanotechnology. The rollerNIL project aims at the replication of different kinds of complex optical nanostructures using roller-based nanoimprint lithography. Roll-to-roll as well as roll-to-plate nanoimprinting will be used. Master, mat ...+
Many „intelligent products“, that can be thought of today, cannot be fabricated with existing production methods or cannot be fabricated in a cost efficient way. These are – among others – especially individualized, 3D printed products with directly integrated sensors, LEDs, OLEDs, display ...+
SolarTrap focus on the theoretical and experimental studies for the light manipulation in organic semiconductors. During the last decade, thin layers of organic semiconductors have attracted steadily increasing research interest, especially a cheap and easy fabrication of high-performance photo-volt ...+
Networks
Profactor ist member in the following research and technology networks:
- EPIC – European Photonics Industry Consortium – https://epic-assoc.com
- BNN – BioNanoNet Association – https://www.bnn.at
- nanoNET.at -NanoNET Austria – http://www.nanonet.at
- photonics Austria -Photonics Austria – https://www.photonics-austria.at
- RéNIL – www.renil.fr
Our senior researchers are active in the following research commitees:
- iMNEs Scientific Advisory Committee – https://www.imnes.org
- EMLC Programme Commitee – https://www.emlc-conference.com/en
- NILindustrialday Steering Committee – https://www.nilindustrialday.com
- MNC Programme Commitee – https://imnc.jp/2023/
- NNT Industry Advisory Board – https://www.nnt2023.org/
- MNE Programme Commitee – https://www.mne-2023.org
Infrastructure
- Atomic force Microscope, Bruker AFM Dimension Edge
- Optical Microscope, Keyence VHX-5000
- Profilometer, Veeco Dektak 150
- Plasma Etcher, Plasma Cleaner, Diener NANO
- Ellipsometer, Sentech
- 3D Laser Scanning Microscope, Keyence VK-X3000
- Contact Angle Measurement DSA100, Krüss Germany
- UV/Vis Spectrometer
- Angle dependent reflection and transmission characterization, inhouse built
Publications
- Temga, J., Karamzadeh, S., Bauer, P., & Haslinger, M. J. (2025). 3-D Printable Crossover-Free WR12 Butler Matrix for a 1×4 Beamforming Antenna Array. In IEEE AP-S/URSI 2025.
- Kolar-Hofer, P., Zampini, G., Derntl, C. G., Soprano, E., Polo, E., Del Pino, P., … & Schrittwieser, S. (2025). Fabrication of nanoparticles with precisely controllable plasmonic properties as tools for biomedical applications. Nanoscale, 17(8), 4423-4438. DOI: 10.1039/D4NR02677B
- Kainz, M., Perak, S., Stubauer, G., Kopp, S., Kauscheder, S., Hemetzberger, J., … & Guillén, E. (2024). Additive and lithographic manufacturing of biomedical scaffold structures using a versatile thiol-ene photocurable resin. Polymers, 16(5), 655. https://doi.org/10.3390/polym16050655
- Reche, J., Haslinger, M., Eibelhuber, M., Poutanen, M., & Origuchi, K. (2024, September). High potential of nanoimprint lithography for LiDAR application. In 39th European Mask and Lithography Conference (EMLC 2024) (Vol. 13273, pp. 166-171). SPIE. https://doi.org/10.1117/12.3028758
- Mühlberger, M. M., Kopp, S., Deyett, A. A., Pribyl, M., Haslinger, M. J., Siegel, A. M., … & Wanzenboeck, H. D. (2023). Nanoimprinted hierarchical micro-/nanostructured substrates for the growth of cardiomyocyte fibers. Nanomanufacturing, 3(4), 416-433. https://doi.org/10.3390/nanomanufacturing3040026
- Cabello‐Olmo, E., Romero, M., Kainz, M., Bernroitner, A., Kopp, S., Mühlberger, M., … & Míguez, H. (2023). Inkjet‐Printed and Nanopatterned Photonic Phosphor Motifs with Strongly Polarized and Directional Light‐Emission. Advanced Functional Materials, 33(51), 2305907. https://doi.org/10.1002/adfm.202305907
- Haslinger, M. J., Kopp, S., Jonaityte, V., Moharana, A., Außerhuber, H., & Mühlberger, M. M. (2023, October). Direct patterning of functional materials using nanoimprint lithography. In 38th European Mask and Lithography Conference (EMLC 2023) (Vol. 12802, pp. 249-257). SPIE. https://doi.org/10.1117/12.2674052
- M.J. Haslinger, O. S. Maier, M. Pribyl, P. Taus, S. Kopp, K. Hingerl, H.D. Wanzenboeck, M. Muehlberger, E. Guillen, Increasing the Stability of Isolated and Dense High Aspect Ratio Nanopillars Fabricated by UV Nanoimprint lithography, Nanomaterials 2023, 13(9), 1556; https://doi.org/10.3390/nano13091556
- Julia Linert, Philipp Taus, Sonia Prado-López, Markus Pribyl, Samuele M. Dozio, Michael J. Haslinger, Elena guillen, Michael Muehlberger, Heinz D. Wanzenboeck, Combined masked LCD-printing and microfabrication for bioimpedance-chips, Micro- and Nanoengineering MNE16 (2022) 100159, https://doi.org/10.1016/j.mne.2022.100159
- M. Mühlberger (ed.), Nanoimprint Lithography – Technology and Applications, MDPI books ISBN 978-3-0365-4482-3 (Hbk); ISBN 978-3-0365-4481-6 (PDF) https://doi.org/10.3390/books978-3-0365-4481-6
- J.Li, J.Liu, W.Huo, J.Yu, X.Liu, M.J.Haslinger, M.Muehlberger, P.Kulha, X.Huang, Micro and Nano Materials and Processing Techniques for Printed Bioresorbable Electronics, Materials Today Nano Volume 18, June 2022, 100201 https://doi.org/10.1016/j.mtnano.2022.100201
- Markus Pribyl, Philipp Taus, Sonia Prado-López, Samuele M. Dozio, Werner Schrenk, Michael J. Haslinger, Sonja Kopp, Michael Mühlberger, Heinz D. Wanzenboeck, Dense High Aspect Ratio Nanostructures for Cell Chip Applications – Fabrication, Replication, and Cell interactions, Micro and Nano Engineering 15 (2022) 100121, https://doi.org/10.1016/j.mne.2022.100121
- Michael Mühlberger, Nanoimprinting of biomimetic nanostructures, Nanomanufacturing 2022, 2(1), 17-40; doi.org/10.3390/nanomanufacturing2010002 https://www.mdpi.com/2673-687X/2/1/2
- Michael Mühlberger, Editorial for Special Issue: Nanoimprint Lithography Technology and Applications, Nanomaterials 2021, 11(9), 2413; https://doi.org/10.3390/nano11092413
- Michael Mühlberger, Stephan Ruttloff, Dieter Nees, Amiya Moharana, Maria R. Belegratis, Philipp Taus, Sonja Kopp, Heinz Wanzenböck, Adrian Prinz and Daniel Fechtig, Nanoimprint replication of biomimetic, multilevel undercut nanostructures, Nanomaterials 2021, 11(4), 1051; https://doi.org/10.3390/nano11041051 https://www.mdpi.com/2079-4991/11/4/1051
- P. Taus, A. Prinz, H. Wanzenboeck, P. Schuller, A. Tsenov, M. Schinnerl, M.M. Shawrav, M.Haslinger, M. Muehlberger, Mastering of NIL stamps with undercut T-shaped features from single layer to multilayer stamps, Nanomaterials 2021, 11(4), 956; https://doi.org/10.3390/nano11040956
- Iris Prinz, Michael J. Haslinger, Michael Mühlberger, Gottfried Reiter, Adrian Prinz, Martina M. Schmidt, Thorsten Schaller, Maria Bauer, Maurizio Musso, Georg Bauer, Industrial View of Plasmonic Devices made by Nanoimprint or Injection Molding, Journal of Applied Physics 129, 130902 (2021); https://doi.org/10.1063/5.0039152
- Vaclav Prajzler, Vaclav Chlupaty, Milos Neruda, Pavel Kulha, Sonja Kopp and Michael Mühlberger, Optical Polymer Waveguides Fabricated by Roll-to-Plate Nanoimprinting Technique, Nanomaterials 2021, 11(3), 724; https://doi.org/10.3390/nano11030724
- Hubert Brueckl, Astrit Shoshi, Stefan Schrittwieser, Barbara Schmid, Pia Schneeweiss, Tina Mitteramskogler, Michael Haslinger, Michael Muehlberger, Joerg Schotter, Nanoimprinted multifunctional nanoprobes for a homogeneous immunoassay: a top-down fabrication approach, Sci Rep 11, 6039 (2021). https://doi.org/10.1038/s41598-021-85524-8
- Michael Haslinger *, Dmitry Sivun, Hannes Pöhl, Battulga Munkhbat, Michael Mühlberger, Thomas A. Klar, Markus C. Scharber, Calin Hrelescu,, Plasmon-assisted Direction- and Polarization-Sensitive Organic Thin-Film Detector, Nanomaterials 2020, 10(9), 1866; https://doi.org/10.3390/nano10091866
- M.J. Haslinger, T. Mitteramskogler, S. Kopp, H. Leichtfried, M. Messerschmidt, M.W. Thesen and M. Mühlberger, Development of a Soft UV-NIL Step&Repeat and Lift-Off Process Chain for High Speed Metal Nanomesh Fabrication, Nanotechnology 31 (2020) 345301
- Amiya R. Moharana, Michael J. Haslinger, Helene M. Außerhuber, Tina Mitteramskogler, Michael M. Mühlberger, Multilayer Nanoimprinting to create hierarchical stamp masters for Nanoimprinting of optical micro- and nanostructures, Coatings 2020, 10, 301; doi:10.3390/coatings10030301
- Stefan Schrittwieser, Michael J. Haslinger, Tina Mitteramskogler, Michael Muehlberger, Astrit Shoshi, Hubert Brueckl, Martin Bauch, Theodoros Dimopoulos, Barbara Schmid and Joerg Schotter, Multifunctional Nanostructures and Nanopocket Particles Fabricated by Nanoimprint Lithography, Nanomaterials 2019, 9(12), 1790; https://doi.org/10.3390/nano9121790
- Michael J. Haslinger, Amiya R. Moharana and Michael Mühlberger, Antireflective Moth-Eyes Structures on Curved Surfaces fabricated by Nanoimprint Lithography, SPIE Proceedings Volume 11177, 35th European Mask and Lithography Conference (EMLC 2019); 111770K (2019) http://dx.doi.org/10.1117/12.2535683
- Tina Mitteramskogler, Michael J. Haslinger, Ambiörn Wennberg, Iván Fernandez-Martínez, Michael Muehlberger, Matthias Krause and Elena Guillén, Preparation and Characterization of Solar Thermal Absorbers by Nanoimprint Lithography and Sputtering, MRS Advances 2019, 4(35), 1905-1911. https://doi.org/10.1557/adv.2019.285
- Conor O’Mahony, Andrea Bocchino, Michael J Haslinger, Stefan Brandstätter, Helene Außerhuber, Klaudia Schossleitner, A James P Clover and Daniel Fechtig, Piezoelectric inkjet coating of injection moulded, reservoir-tipped microneedle arrays for transdermal delivery, Journal of Micromechanics and Microengineering J. Micromech. Microeng. 29 085004 (2019) https://doi.org/10.1088/1361-6439/ab222b
- Klaudia Schossleitner, Conor O’Mahony, Michael Haslinger, Stefan Brandstätter, Sabrina Demuth, Daniel Fechtig, Peter Petzelbauer, Differences in biocompatibility of microneedles from cyclic oleofin polymers with human endothelial and epithelial skin cells, Journal of Biomedical Materials Research Part A, Volume107, Issue3, March 2019, Pages 505-512, DOI: 10.1002/jbm.a.36565
- Michael J. Haslinger, Tina Mitteramskogler, Astrit Shoshi, Jörg Schotter, Stefan Schrittwieser, Michael Mühlberger, and Hubert Brueckl, UV-Nil based fabrication of plasmon-magnetic nanoparticles for biomolecular sensing, Proc. SPIE 10722, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XVI, 107222O (19 September 2018); doi: 10.1117/12.2321036; https://doi.org/10.1117/12.2321036
- Tina Mitteramskogler, Michael J. Haslinger, Astrit Shoshi, Stefan Schrittwieser, Joerg Schotter, Hubert Brueckl,Michael Muehlberger, Fabrication of nanoparticles for biosensing using UV-NIL and lift-off, Proc. SPIE 10775, 34th European Mask and Lithography Conference, 107750Y (19 September 2018); doi: 10.1117/12.2323700; https://doi.org/10.1117/12.2323700
- Heinz D Wanzenboeck, Adrian Prinz, Philipp Taus, Patrick Schuller, Mostafa M Shawrav, Markus Schinnerl, Anton Tsenov, Michael Haslinger, Michael Muehlberger; Mastering of NIL stamps with undercut T-shaped features – from single layer to multilayer stamps, Microelectronic Engineerin
- Muehlberger, M. J. Haslinger, J. Kurzmann, M. Ikeda, A. Fuchsbauer, T. Faury, T. Koepplmayr, H. Ausserhuber, J. Kastner, C. Woegerer, D. Fechtig; Function Follows Form: Combining Nanoimprint and Inkjet Printing, Proc. SPIE 10446, 33rd European Mask and Lithography Conference, 104460Z (28 September 2017); doi: 10.1117/12.2282503; http://dx.doi.org/10.1117/12.2282503;
- A. Shoshi, P. Schneeweiss, M. Haslinger, T. Glatzl, G. Kovács, J. Schinerl, M. Muehlberger and H. Brueckl; Biomolecular detection based on the rotational dynamics of magneto-plasmonic nanoparticles, Proceedings of the Eurosensors 2017 Conference, Proceedings 2017, 1(4), 541; doi:10.3390/proceedings1040541
- M.J. Haslinger, M.A. Verschuuren, R. van Brakel, J. Danzberger, I. Bergmair, M. Mühlberger; Stamp degradation for high volume UV enhanced substrate conformal imprint lithography (UV SCIL), Microelectronic Engineering Volume 153, 5 March 2016, Pages 66–70, doi: 10.1016/j.mee.2016.01.018
- Lin Dong, Michael J. Haslinger, Jürgen Danzberger, Iris Bergmair, Kurt Hingerl, Calin Hrelescu, and Thomas A. Klar; Giant Cross Polarization in a Nanoimprinted Metamaterial Combining a Fishnet with its Babinet complement, Optics Express Vol. 23, Issue 15, pp. 19034-19046 (2015) •doi: 10.1364/OE.23.019034
- Milka M. Jakovljević, Goran Isić, Babak Dastmalchi, Iris Bergmair, Kurt Hingerl and Radoš Gajić; Polarization-dependent optical excitation of gap plasmon polaritons through rectangular hole arrays, Appl. Phys. Lett. 106 (2015) 143106; [http://dx.doi.org/10.1063/1.4917510
- Thomas Köpplmayr, Lukas Häusler, Iris Bergmair, Michael Mühlberger; Nanoimprint lithography on curved surfaces prepared by fused deposition modelling, Surf. Topogr.: Metrol. Prop. 3 (2015) 024003
- Mühlberger, M. Rohn, J. Danzberger, E. Sonntag, A. Rank, L. Schumm, R. Kirchner, C. Forsich, S. Gorb, B. Einwögerer, E. Trappl, D. Heim, H. Schift, I. Bergmair; UV-NIL fabricated bio-inspired inlays for injection molding to influence the friction behaviour of ceramic surfaces, Microelectronic Engineering 141 (2015) 140-144 (free download for limited time here)
- Kirchner, V. A. Guzenko, M. Rohn, E. Sonntag, M. Muehlberger, I. Bergmair, H. Schift; Bio-inspired 3D funnel structures made by grayscale electron-beam pattering and selective topography equilibration, Microelectronic Engineering 141 (2015) 107 – 111
- Sabrina Weigl, Klaus Bretterbauer, Günter Hesser, Wolfgang Schöfberger, Christian Paulik; Synthesis, characterization, and description of influences on the stabilizing activity of antioxidant-functionalized multi-walled carbon nanotubes, Carbon 81 (2015) 305-331, [doi:10.1016/j.carbon.2014.09.061
- Simon Waid, Heinz Wanzenböck, Michael Mühlberger, Marco Gavagnin, Emmerich Bertagnolli; Focused ion beam direct patterning of hardmask layers, J. Vac. Sci. Technol. B 32, 041602 (2014); [http://dx.doi.org/10.1116/1.4884777
- Simon Waid, Heinz Wanzenböck, Michael Mühlberger, Marco Gavagnin, Emmerich Bertagnolli; Generation of 3D Nanopatterns with Smooth Surfaces, Nanotechnology 25 (2014) 315302. [doi:10.1088/0957-4484/25/31/315302
- Dipu Borah, Claudia D. Simao, Ramsankar Senthamaraikannan, Sozaraj Rasappa, Achille Francone, Olivier Lorret, Mathieu Salaun, Barbara Kosmala, Nikolaos Kehagias, Marc Zelsmann, Clivia M. Sotomayor-Torres, Michael A. Morris; Soft-graphoepitaxy using nanoimprinted polyhedral oligomeric silsesquioxane substrates for the directed self-assembly of PS-b-PDMS, European Polymer Journal, Volume 49, Issue 11, November 2013, Pages 3512-3521
- Simon Waid, Heinz D. Wanzenboeck, Marco Gavagnin, Ruppert Langegger, Michael Muehlberger, and Emmerich Bertagnolli; Focused ion beam induced Ga-contamination—An obstacle for UV-nanoimprint stamp repair?, J. Vac. Sci. Technol. B 31, 041602 (2013); [http://dx.doi.org/10.1116/1.4813025
- Mathieu Salaun, Marc Zelsmann, Sophie Archambault, Dipu Borah, Nikolaos Kehagias, Claudia Simao, Olivier Lorret, Matthew T. Shaw, Clivia M. Sotomayor Torres and Mickael A. Morris; Fabrication of highly ordered sub-20nm silicon nanopillars by block copolymer lithography combined with resist design, J. Mater. Chem. C 1 (2013) 3544-3550 DOI: 10.1039/C3TC30300D
- Thomas W. H. Oates, Babak Dastmalchi, Christian Helgert, Lars Reissmann, Uwe Huebner, Ernst-Bernhard Kley, Marc A. Verschuuren, Iris Bergmair, Thomas Pertsch, Kurt Hingerl, and Karsten Hinrichs; Optical activity in sub-wavelength metallic grids and fishnet metamaterials in the conical mount, Optical Materials Express 3(4) 439-451 (2013) [http://dx.doi.org/10.1364/OME.3.000439
- Michael Mühlberger, Hannes Fachberger, Iris Bergmair, Michael Rohn, Bernd Dittert, Rainer Schöftner, Thomas Rothländer, Dieter Nees, Ursula Palfinger, Anja Haase, Alexander Fian, Martin Knapp, Claudia Preininger, Gerald Kreindl, Michael Kast, Thomas Fromherz; Nanoimprint Activities in Austra in the research project cluster NILaustria, Proc. SPIE. 8352, 28th European Mask and Lithography Conference 83520O (April 16, 2012) doi: 10.1117/12.921324
- Iris Bergmair, Wolfgang Hackl, Maria Losurdo, Christian Helgert, Goran Isic, Michael Rohn, Milka M Jakovljevic, Thomas Mueller, Maria Giangregorio, Ernst-Bernhard Kley, Thomas Fromherz, Rados Gajic, Thomas Pertsch, Giovanni Bruno and Michael Muehlberger; Nano- and microstructuring of graphene using UV-NIL, Nanotechnology 23 (2012) 335301 (6pp) doi:10.1088/0957-4484/23/33/335301
- Simao, A. Francone, D. Borah, O. Lorret, M. Salaun, B. Kosmala, M. T. Shaw, B. Dittert, N. Kehagias, M. Zelsmann, M. A. Morris, and C. M. Sotomayor Torres,; Soft Graphoepitaxy of Hexagonal PS-b-PDMS on Nanopatterned POSS Surfaces fabricated by Nanoimprint Lithography, Journal of Photopolymer Science and Technology 25(2) 239-244 (2012)
- Waid, H.D. Wanzenboeck, M. Muehlberger, E. Bertagnolli; Optimization of 3D patterning by Ga implantation and reactive ion etching (RIE) for nanoimprint lithography (NIL) stamp fabrication, Microelectronic Engineering 97 (2012) 105-108 link
- Lausecker, M. Grydlik, M. Brehm, I. Bergmiar, M. Mühlberger, T. Fromherz, G. Bauer; Anisotropic remastering for reducing features sizes on UV nanoimprint lithogrphy replica molds, Nanotechnology 23 (2012) 165302 (5pp)
- Claudia Preininger, Ursula Sauer, Mustapha Chouiki, Rainer Schöftner; Nanostructures in protein chips: Effect of print buffer additive and wettability on immobilization and assay performance, Microelectronic Engineering 88 (2011) 1856-1859 [http://dx.doi.org/10.1016/j.mee.2011.01.040
- Nikolaos Kehagias, Marc Zelsmann, Mustapha Chouiki, Achille Francone, Vincent Reboud, Rainer Schoeftner, Clivia Sotomayor Torres; Low temperature direct imprint of polyhedral oligomeric silsesquioxane (POSS) resist, Microelectronic Engineering 88 (2011) 1997-1999; [http://dx.doi.org/10.1016/j.mee.2011.02.047
- I Bergmair, B Dastmalchi, M Bergmair, A Saeed, W Hilber, G Hesser, C Helgert, E Pshenay-Severin, T Pertsch, E B Kley, U Hübner, N H Shen, R Penciu, M Kafesaki, C M Soukoulis, K Hingerl, M Muehlberger and R Schoeftner; Single and multilayer metamaterials fabricated by nanoimprint lithography, Nanotechnology 22 (2011) 325301 [http://dx.doi.org/10.1088/0957-4484/22/32/325301
- Muehlberger, M. Boehm, I. Bergmair, M. Chouiki, R. Schoeftner, G. Kreindl, M. Kast, D. Treiblmayr, T. Glinsner, R. Miller, E. Platzgummer, H. Loeschner, P. Joechl, S. Eder-Kapl, T. Narzt, E. Lausecker, T. Fromherz; Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5 nm hp, Microelectronic Engineering 88 (2011) 2070–2073; [http://dx.doi.org/10.1016/j.mee.2008.11.020
- Lausecker, M. Brehm, M. Grydlik, F. Hackl, I. Bergmair, M. Mühlberger, T. Fromherz, F. Schäffler, and G. Bauer; UV nanoimprint lithography for the realization of large-area ordered SiGe/Si(001) island arrays, Appl. Phys. Lett. 98, 143101 (2011); [http://link.aip.org/link/doi/10.1063/1.3575554
- Iris Bergmair, Michael Mühlberger, Kurt Hingerl, Ekaterina Pshenay-Severin, Thomas Pertsch, Ernst Bernhard Kley, Holger Schmidt, Rainer Schöftner; 3D materials made of gold using Nanoimprint Lithography, Microelectronic Engineering 87 (2010) 1008-1010
- Bergmair, M. Mühlberger, E. Lausecker, K. Hingerl and R. Schöftner; Diffusion of thiols during microcontact printing with rigid stamps, Microelectronic Engineering 87 (5-8) 2010,848-850
- Jannesary, I. Bergmair, S. Zamiri, K. Hingerl; Nano-silicon based photonic crystal stamps with electron beam lithography (EBL) technology, Proc. SPIE, Vol. 7643, 76431X (2010)
- Wanzenböck, S. Waid, E. Bertagnolli, M. Mühlberger, I. Bergmair, R. Schöftner; NIL stamp modification utilizing focused ion beams, Journal of Vacuum Science and Technology B 27 (6) 2009 2679-2685
- Bergmair, M. Mühlberger, W. Schwinger, K. Hingerl, E.-B. Kley, H. Schmidt, R. Schöftner; Reversal µCP using hard stamps, Microelectronic Engineering 86 (4-6) 2009 650-653
- Klukowska, A. Kolander, I. Bergmair, M. Mühlberger, H. Leichtfried, F. Reuther, G. Grützner, R. Schöftner; Novel transparent hybrid polymer working stamp for UV-imprinting, Microelectronic Engineering 86 (4-6) 2009 697-699
- Mühlberger, I. Bergmair, A. Klukowska, A. Kolander, H. Leichtfried, E. Platzgummer, H. Löschner; UV-NIL with working stamps made from Ormostamp, Microelectronic Engineering 86 (4-6) 2009 691-693
- M.T. Troya, F. Rubio, M.J. Prieto, D. Lorenzo, J.L. Fernández-Cabo, R. Schöftner; Natural durability of reed (Phragmites australis) against wood decay organisms: relation to other forest species, Investigación Agraria, Sistemas y Recursos Forestales 18 (3) 2009
- Haubner, W. Schwinger, J. Haring, R. Schöftner; Sol-gel preparation of catalyst particles on substrates for hot-filament CVD nanotube deposition, Diamond and Related Materials 17 (7-10) 2008 1452-1457
- I.Bergmair, M. Mühlberger, M. Gusenbauer, R. Schöftner, Kurt Hingerl; Equalising stamp and substrate deformations in solid parallel-plate UV-based nanoimprint lithography, Microelectronic Engineering 85 (5-6) 2008 822-824
- Schwinger, E. Lausecker, I. Bergmair, M. Grydlik, T. Fromherz, C. Hasenfuß, R. Schöftner; Fabrication of nano-gold islands with [mu]m spacing using 2.5 dimensional PDMS stamps, Microelectronic Engineering 85 (5-6) 2008 1346-1349
- E Lausecker, W Schwinger, I Bergmair, M Mühlberger and R Schöftner; Large area μm and sub-μm structuring of gold layers with microcontact printing using 4″ and 1″ PDMS stamps, Journal of Physics: Conference Series 100 (2008) 052024
- W Schwinger, J Haring, A Jantscher, R Haubner, I Gerger, M Bodnarchuk, M Kovalenko, W Heiss and R Schöftner; Preparation of catalytic nano-particles and growth of aligned CNTs with HF-CVD, Journal of Physics: Conference Series 100 (2008) 052092
- I Bergmair, M Mühlberger, M Gusenbauer, R Schöftner, T Glinsner, and K Hingerl; Effects of a compliant layer in solid parallel-plate UV-based nanoimprint lithography, Journal of Physics: Conference Series 100 (2008) 042001
- Anna Klukowska, Marko Vogler, Anett Kolander, Freimut Reuther, Gabi Gruetzner, Michael Muehlberger, Iris Bergmair, Rainer Schoeftner; Alternative Approach to Transparent Stamps for UV-based Nanoimprint Lithography – Techniques and Materials, Proc. of SPIE Vol. 6792 67920J-1
- Mühlberger, I. Bergmair, W. Schwinger, M. Gmainer, R. Schöftner, T. Glinsner, Ch. Hasenfuß, K. Hingerl, M. Vogler, H. Schmidt, E.B. Kley; A Moire method for high accuracy alignment in nanoimprint lithography, Microelectronic Engineering 84 (5-8) 2007 925-927
- Glinsner, P. Lindner, M. Mühlberger, I. Bergmair, R. Schöftner, K. Hingerl, H. Schmid, E.-B. Kley; Fabrication of 3D-photonic crystals via UV-nanoimprint lithography, Journal of Vacuum Science and Technology B 25 (2007) 2337
- Grigaliunas, S. Tamulevicius, M. Mühlberger, G. Mittendorfer, T. Glinsner, G. Zakas, S. Meskinis, A. Guobiene, A. Palevicius, G. Janusas; Imprint lithography for large scale angular encoders, Materials Science 13 Issue 2 (2007) 103-106
- Vogler, S. Wiedenberg, M. Mühlberger, I. Bergmair, T. Glinsner, H. Schmidt, E. Kley, G. Grützner; Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography, Microelectronic Engineering 84 5-8 (2007) 984-988
- Mehnen, E. Kaniusas, J. Kosel, H. Pfützner, T. Meydan, M. Vazquez, M. Rohn, A.M. Merlo, B. Marquardt, S. Sauermann; Functional electrical stimulation monitoring by bending sensitive magnetostrictive bilayer sensors, International Journal of Applied Electromagnetics and Mechanics 25 Number 1-4 (2007) 485-488
- Kosel, H. Pfützner, S. Traxler, E. Kaniusas, L. Mehnen, T. Meydan, M. Vazquez, M. Rohn, A.M. Merlo, B. Marquardt; Contactless detection of bending sensitive magnetostrictive bilayers utilizing higher harmonics, International Journal of Applied Electromagnetics and Mechanics Volume 25, Number 1-4 (2007)
- Vázquez, G. Badini, K. Pirota, J. Torrejón, A. Zhukov, A. Torcunov, H. Pfützner, M. Rohn, A. Merlo, B. Marquardt, T. Meydan; Applications of amorphous microwires in sensing technologies, International Journal of Applied Electromagnetics and Mechanics Volume 25, Number 1-4 (2007)
- Pfützner, E. Kaniusas, J. Kosel, L. Mehnen, T. Meydan, F. Borza, M. Vázquez, M. Rohn, A.M. Merlo, B. Marquardt; First magnetic materials with sensitivity for the physical quantity “curvature”, Journal of Materials Processing Technology 181 Issues 1-3 (2007) 186-189
- Grigaliūnas, S. Tamulevičius, M. Mühlberger, D. Jucius, A. Guobienė, V. Kopustinskas, A. Gudonytė; Nanoimprint Lithography Using IR Laser Irradiation, Applied Surface Science 253 Issue 2 (2006) 646-650
- Kaniusas, H. Pfützner, L. Mehnen, J. Kosel, G. Varoneckas, A. Alonderis, T. Meydan, M. Vázquez, M.Rohn, A.M. Merlo, B. Marquardt; Magnetoelastic bilayer concept for skin curvature sensor, Ultragarsas (“Ultrasound” in Lithuanian) 52 Issue 3 (2004) 42-46
- Schöftner, W. Buchberger; Systematic investigations of different capillary electrophoretic techniques for separation of methylquinolines, Journal of Separation Science 26 Issue 14 (2003) 1247-1252
- Schöftner, W. Buchberger; Review: Determination of low-molecular-mass quternary ammonium compounds by capillary electrophoresis and hyphenation with mass spectrometry, Electrophoresis 24 Issue 12-13 (2003) 2111-2118